Annual Call for Applications - Deadline is January 15, 2019
Our international limited residency MFA in Photography is an innovative program designed for both mature individuals with established experience in the field as well as recent graduates who wish to further their own practice. Our program is the only low-residency MFA in the United States focusing solely on Photography. We offer the pursuit of an MFA degree without the inconvenience of having to leave your established network and studio behind. Professional credentials and growth as an artist & educator can be achieved while maintaining your current responsibilities and commitments.
Our approach offers a “blended learning model” — we pair research, independent study, and critiques with on-site classroom learning in various locations around the globe. During the two-week intensive summer sessions students will have ample opportunity to interact with faculty and make use of the advanced analogue and digital facilities at the Hartford Art School – including large format Epson printers, Imacon Flextight scanners and a Colex RA-4 Color Processor. The faculty is gathered from the United States and international locations and is augmented by visiting artists, curators, writers and other leading professionals in the field of photography.
The program couples intensive on-campus sessions during the summer with a travel component in the spring and fall. The three summer sessions meet at the University of Hartford for two-weeks, during which students and faculty interact inside and outside the classroom. The fall and spring sessions meet at off-site locations (New York City, San Francisco, Berlin, and other sites) for seven-to-ten days. In the time between classroom sessions, students complete course assignments and maintain regular contact with their Thesis Advisor. The total time to the MFA is twenty-five months, of which only ten to twelve weeks are spent away from your studio.
Faculty and Guest Lecturers Include:
Robert Lyons - Director
Michael Vahrenwald, Dr. Jörg Colberg, Alice Rose George, Michael Schäfer, Mary Frey, Mark Steinmetz, Ute Mahler, Alec Soth, Dru Donovan, John Priola, Tod Papageorge, Felix Hoffman, Lisa Kereszi, Irina Rozovsky, Andrianna Campbell, Thomas Weski, David Campany, Paul Schiek, Emeka Okereke and Hiroh Kikai.
Alumni Include:
Jo Schryer (QC), Matt Eich (USA), Bryan Schutmaat (USA), Daniel Claus Reuter (Iceland), Adam J Long (USA), Dorothee Deiss (DE), Felipe Russo (Brazil), Aaron Hardin (USA), Dagmar Kolatschny (DE), J Carrier (USA), Sanne Vils Axelsen (Denmark),
Saleem Ahmed (USA), Nicolas Silberfaden (Argentina), Morgan Ashcom (USA), Robin Dahlberg (USA), Amanda James (USA), Chikara Umihara (Japan) and Ernesto Solana (Mexico).
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Please note: all applicants must already have a recognized baccalaureate degree from an accredited institution. Students who earned their degree outside of the USA, will use the World Education Services (WES) (http://www.wes.org)to validate their transcripts. In addition, international students are required to have completed the TOEFL unless waived by the director of the program.
The Hartford Art School is accredited by (NASAD) --- The University of Hartford is accredited by (NEASC)
Thepriority deadline for application is January 15, 2019.Applications will be considered until the class is full, after that date applications are accepted on a rolling basis until the cohort is filled. In February, shortlisted applicants will be notified. In early March, all applicants will be notified of Acceptance Decisions. In April, within two weeks of accepting an offer to enroll a $500 Enrollment Confirmation is due to the University of Hartford. Merit Award offers will be made in late May to all Accepted and Confirmed members of the Class of 2021.
Program Director:Robert Lyons
Program Manager:Erica Ann Flood
Address:
Hartford Art School
University of Hartford
200 Bloomfield Ave
West Hartford, CT 06117