The limited residency MFA in Photography at the Hartford Art School is an innovative program designed for both mature individuals with established experience in the field as well as recent graduates who wish to further their own practice and acquire an MFA degree in order to facilitate their professional credentials as artists and educators. It differentiates itself from existing programs in that the new program is an International limited-residency program.
The program couples intensive on-campus sessions during the summer with a travel component in the spring and fall. The three summer sessions meet at the University of Hartford for two-weeks, during which students and faculty interact inside and outside the classroom. The two fall and two spring sessions meet at off-site locations (New York City, Berlin, and other sites) for seven-to-ten days. In the time between classroom sessions, students complete course assignments and maintain regular contact with their Thesis Advisor. The total time to the MFA is twenty-five months, of which only ten to twelve weeks are spent away from your studio.
Our approach offers a “blended learning model” — research, independent study, and online critiques - with on-site classroom learning. During the summer sessions students will be in class and have ample opportunity to interact with faculty and make use of the advanced analogue and digital facilities at the Hartford Art School. The faculty is gathered from the United States and international locations and will be augmented by visiting artists, curators, writers and other leading professionals in the field.
This new model enhances our ability to be a truly international program - from our students to faculty, and encompassing off-premise meeting destinations. We believe that the art world is situated within a “global market” and our program is uniquely designed to access and utilize this enriching perspective.