The limited-residency MFA in Photography at the Hartford Art School is an innovative program for experienced professionals and recent graduates looking to advance their artistic practice and enhance their credentials as artists and educators with an MFA. This program distinguishes itself through its international focus and limited-residency structure.
The program blends intensive on-campus summer sessions with travel during the spring and fall. The three summer sessions meet for two weeks at the University of Hartford, providing students and faculty with ample opportunities for interaction both inside and outside the classroom. The two fall and two spring sessions are held for eight to ten days at off-site locations including Tokyo and Berlin. Between these sessions, students complete assignments and maintain regular contact with their thesis advisor. The MFA program takes twenty-five months to complete, requiring only ten to twelve weeks away from your studio.
Our blended learning model combines research, independent study, and online critiques with on-site classroom instruction. While in session, students participate in classes, engage with faculty, and utilize the Hartford Art School's advanced analogue and digital facilities. Our faculty are drawn from the United States and abroad, and are joined by visiting artists, curators, writers, and other leading professionals.
This model enhances our ability to operate as a truly international program, encompassing our students, faculty, and off-site meeting locations. Recognizing the global nature of the art world, our program is uniquely designed to access and leverage its diverse perspectives.